TOP GIGASPIN88 SECRETS

q to manage “EUV” masks and “EUV” reticles created for integrated circuits, not specified by 3B001.g, and aquiring a mask “substrate blank” specified by 3B001.j.” A complex Observe is included to clarify that masks or reticles with a mounted pellicle are regarded as masks and reticles. e.three. “Superconductive” electromagnets an